[29p-PA1-1~17] 8. プラズマエレクトロニクス

[29p-PA1-6] Silicon cluster volume fraction of silicon thin films prepared by multi-hollow plasma discharge CVD (1:30 PM ～ 3:30 PM) (8.3)

^○金淵元，Kosuke Hatozaki，Yuji Hashimoto，Hyunwoong Seo，Kunihiro Kamataki，Giichiro Uchida，Naho Itagaki，Kazunori Koga，Masaharu Shiratani (九大)

キーワード：CVD、silicon cluster、silicon thin film