[29p-PA9-1~23] 16.3 Bulk, thin-film and other silicon-based solar cells

[29p-PA9-11] ▲Detailed Study on the c-Si Surface Passivation Mechanism of O3-Based Batch Atomic Layer Deposited AlOx for Solar Cell Applications

^○Hyunju Lee^1,4, Tomihisa Tachibana^1,4, Norihiro Ikeno^1,4, Hiroki Hashiguchi^1,4, Yuki Tsuchiya^1,4, Koji Arafune^2,4, Haruhiko Yoshida^2,4, Shin-ichi Satoh^2,4, Toyohiro Chikyow³, Atsushi Ogura^1,4 (Meiji University¹, University of Hyogo², National Institute for Materials Science³, JST-CREST⁴)

Keywords:Aluminum oxide surface passivation、Atomic layer deposition、Silicon solar cell