[30a-B1-1~10] 7.2 Electron microscopes, evaluation, measurement and analysis

[30a-B1-10] Aspect ratio dependence of a secondary electron yield for line pattern

^○Daisuke Bizen¹, Yasunari Sohda¹, Hideyuki Kazumi² (Hitachi Central Research Lab.¹, Hitachi High-Technologies Corp.²)

Keywords:走査電子顕微鏡、二次電子放出