[30a-F2-1~10] 6.3 Oxide-based electronics

[30a-F2-7] Fabrication and characterization of p-type Cu₂O thin films by mist CVD method

^○Takumi Ikenoue¹, Taisho Yamaguchi¹, Shin-ichi Sakamoto¹, Yoshitaka Inui¹ (Univ. of Shiga Pref.¹)

Keywords:ミストCVD、Cu2O