[30a-G6-1~11] 13.4 Interconnection technology

[30a-G6-6] Ultra low-k SiCOH film deposited by neutral enhanced beam CVD generated by microwave plasma II

^○Yoshiyuki Kikuchi^1,2, Akira Wada¹, Seiji Samukawa^1,3 (IFS, Tohoku Univ¹, Tokyo Electron Development Inst.², WPI-AIMR, Tohoku Univ³)

Keywords:low-k膜、マイクロ波プラズマ、中性粒子ビームCVD