[30p-G6-1~6] 13.4 Interconnection technology

[30p-G6-6] Reduction of sheet resistance of PtSi formed by Kr sputtering

^○Yasuhiko Yoshimura¹, Xuiaopeng Wu¹, Akihiro Yoshimi¹, Jun Arima¹, Shun-ichiro Ohmi¹ (Tokyo Institute of Technology¹)

Keywords:シリサイド、Kr