[17a-A10-1~11] 6.3 Oxide-based electronics

[17a-A10-9] Fabrication of β-MoO₃(011) epitaxial thin films using DC magnetron sputtering

^○Ryota Shimizu¹, Kuniko Yamamoto¹, Tohru Suzuki¹, Takeo Ohsawa², Susumu Shiraki¹, Taro Hitosugi¹ (Tohoku Univ.¹, NIMS²)

Keywords:モリブデン酸化物,マグネトロンスパッタ法,低温成膜