The 75th JSAP Autumn Meeting, 2014

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Oral presentation

07. Beam Technology and Nanofabrication » 7.3 Lithography

[17a-A14-1~12] 7.3 Lithography

Wed. Sep 17, 2014 9:00 AM - 12:30 PM A14 (E305)

9:30 AM - 9:45 AM

[17a-A14-2] Development characteristics and pattern profiles of fullerene-incorporated positive tone electron beam resists

○Shingo Ikeda1, Yukihiro Higashi1, Hironori Asada1, Ryoichi Hshino2 (Yamaguchi Univ.1, Gluon Lab2)

Keywords:電子線レジスト,ポジ型レジスト