10:00 AM - 10:15 AM
[17a-A14-4] Study on Resist Performance of Chemically Amplified Molecular Resists based on Cyclic Oligomer
Keywords:化学増幅型レジスト,分子レジスト,電子ビーム
Presentation information
Oral presentation
07. Beam Technology and Nanofabrication » 7.3 Lithography
[17a-A14-1~12] 7.3 Lithography
Wed. Sep 17, 2014 9:00 AM - 12:30 PM A14 (E305)