4:30 PM - 4:45 PM
[17p-A14-9] Research for Mechanism of Abnormal Oxidation on Copper Surface
Keywords:半導体,洗浄剤,CMP
Symposium
Symposium » Interfacial nano electrochemistry: Research frontiers of semiconductor wetprocesses
Wed. Sep 17, 2014 1:30 PM - 5:30 PM A14 (E305)
4:30 PM - 4:45 PM
Keywords:半導体,洗浄剤,CMP