Growth of group III nitrides on hcp metals by pulsed sputtering deposition

Presentation information

Oral presentation

15. Crystal Engineering » 15.4 III-V-group nitride crystals

Wed. Sep 17, 2014 1:15 PM - 6:45 PM C5 (Open Hall)

6:00 PM - 6:15 PM

^○Hyeryun Kim¹, Jitsuo Ohta¹, Ryuta Tanaka¹, Atsushi Kobayashi¹, Kohei Ueno¹, Hiroshi Fujioka^1,2 (The Univ. of Tokyo¹, JST-CREST²)

Keywords:スパッタ,窒化物半導体,金属