The 75th JSAP Autumn Meeting, 2014

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Oral presentation

03. Optics and Photonics » 3.8 Optical measurement technology and devices

[17p-S8-1~13] 3.8 Optical measurement technology and devices

Wed. Sep 17, 2014 1:30 PM - 5:00 PM S8 (S8)

3:30 PM - 3:45 PM

[17p-S8-8] Influences of surface integrity in wafer thickness measurements by reflection spectroscopy

○Teppei Onuki1, Hirotaka Ojima1, Jun Shimizu1, Libo Zhou1 (Ibaraki Univ.1)

Keywords:薄ウェハ,厚さ計,表面性状