The 75th JSAP Autumn Meeting, 2014

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[18a-A19-1~13] 13.3 Si Process・Interconnect・MEMS・Integration

Thu. Sep 18, 2014 9:00 AM - 12:30 PM A19 (E311)

9:15 AM - 9:30 AM

[18a-A19-2] \delta doping of Bi in Si crystal with use of Bi nanoline as a dopant source: Elucidation of doping mechanism by using EXAFS

K. Murata1,2, K. Nitta3, T. Uruga3, Y. Terada3, K. Nittoh1, O. Sakata1, K. Miki1,2 (NIMS1, Univ. of Tsukuba2, JASRI3)

Keywords:ドーピング,ナノ構造,シリコン