High-speed and low temperature annealing for fabrication oxide semiconductor thin film transistors

Presentation information

Oral presentation

Joint Session K "Wide bandgap oxide semiconductor materials and devices" » Nanocarbon Technology

Thu. Sep 18, 2014 1:15 PM - 5:30 PM A12 (E301)

2:15 PM - 2:30 PM

^○(PC)Heajeong Cheong¹, Shintaro Ogura¹, Heisuke Sakai¹, Manabu Yoshida¹, Hirobumi Ushijima¹, Sei Uemura¹, Nobuko Fukuda¹ (AIST,FLEC¹)

Keywords:IGZO, Microwave, Excimer, Xenon