The 75th JSAP Autumn Meeting, 2014

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Oral presentation

07. Beam Technology and Nanofabrication » 7.6 Ion beams

[18p-A14-1~18] 7.6 Ion beams

Thu. Sep 18, 2014 1:15 PM - 6:15 PM A14 (E305)

1:45 PM - 2:00 PM

[18p-A14-3] Cu pattern etching by using Gas Cluster Ion Beam

○Ryo Hinoura1, Noriaki Toyoda1, Ken-ichi Hara2, Isao Yamada1 (Graduate school of engineering, Univ. of Hyogo1, Tokyo Electron Limited2)

Keywords:ガスクラスターイオンビーム,エッチング