SiC Epitaxial Reactor Cleaning Method Using Chlorine Trifluoride Gas (2)

Presentation information

Oral presentation

15. Crystal Engineering » 15.6 IV-group-based compounds

Thu. Sep 18, 2014 2:00 PM - 5:15 PM A17 (E308)

5:00 PM - 5:15 PM

^○Kosuke Mizuno¹, Yusuke Fukumoto¹, Hitoshi Habuka¹, Yuuki Ishida², Toshiyuki Ohno³ (Yokohama National University¹, AIST², FUPET³)

Keywords:クリーニング