1:30 PM - 3:30 PM
[18p-PB5-9] Changes in the local atomic structure in SiNx films grown by VHF-PECVD
Keywords:窒化シリコン膜,化学的気相成長,プラズマ成膜
Presentation information
Poster presentation
08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment
[18p-PB5-1~11] 8.3 Plasma deposition of thin film and surface treatment
Thu. Sep 18, 2014 1:30 PM - 3:30 PM PB5 (Gymnasium2)
ポスター掲示時間13:30～15:30(PB5会場)