The 75th JSAP Autumn Meeting, 2014

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Oral presentation

13. Semiconductors A (Silicon) » 13.2 Insulator technology

[19a-A17-1~12] 13.2 Insulator technology

Fri. Sep 19, 2014 9:00 AM - 12:30 PM A17 (E308)

10:00 AM - 10:15 AM

[19a-A17-5] Origin of thermal instability and subsequent defect formation of La-silicate/Si gate stack

○Yasushi Nakasaki1, Misako Morota1, Akira Takashima1, Koichi Kato1, Yuichiro Mitani1 (Toshiba R&D Center1)

Keywords:La,シリケート,欠陥