The 75th JSAP Autumn Meeting, 2014

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13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[19a-A19-1~13] 13.3 Si Process・Interconnect・MEMS・Integration

Fri. Sep 19, 2014 9:00 AM - 12:30 PM A19 (E311)

9:30 AM - 9:45 AM

[19a-A19-3] In-Situ Observation of Chemical Vapor Deposition in SiHCl3-BCl3 System

Ayumi Saito1, Kanto Miyazaki1, Misako Matsui1, ○Hitoshi Habuka1 (Yokohama National Univ.1)

Keywords:化学気相堆積