10:15 AM - 10:30 AM
[19a-A19-6] Electrical Characterization of SiO2 Films with High Breakdown Voltage Deposited by RF Sputtering Using O2/Ar Mixture
Keywords:ゲート絶縁膜,RFスパッタリング,薄膜トランジスタ
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Oral presentation
13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration
[19a-A19-1~13] 13.3 Si Process・Interconnect・MEMS・Integration
Fri. Sep 19, 2014 9:00 AM - 12:30 PM A19 (E311)