The 75th JSAP Autumn Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[19a-S9-1~11] 8.3 Plasma deposition of thin film and surface treatment

Fri. Sep 19, 2014 9:00 AM - 12:00 PM S9 (S9)

11:45 AM - 12:00 PM

[19a-S9-11] Measurement of Free Radicals in Plasma Activated Water Using UV Absorption Spectroscopy

Jun-Seok Oh1, Kodai Sakuramoto1, Hiroshi Furuta1,2, Akimitsu Hatta1,2 (Kochi Univ. Technol.1, Center for Nanotechnology, Kochi Univ. Technol.2)

Keywords:Plasma activated water,Free radical,UV absorption