Modeling of laser and target interaction in the plasma EUV sources

Presentation information

Oral presentation

07. Beam Technology and Nanofabrication » 7.1 X-ray technologies

Fri. Sep 19, 2014 1:15 PM - 5:00 PM A13 (E304)

2:30 PM - 2:45 PM

^○Akira Sasaki¹, Atsushi Sunahara², Katsunobu Nishihara³ (JAEA¹, ILT², ILE Osaka Univ.³)

Keywords:EUV光源,レーザープラズマ,シミュレーション