The 75th JSAP Autumn Meeting, 2014

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13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[19p-A19-1~15] 13.3 Si Process・Interconnect・MEMS・Integration

Fri. Sep 19, 2014 2:00 PM - 6:00 PM A19 (E311)

2:15 PM - 2:30 PM

[19p-A19-2] Diffusion and insulating barrier made en bloc of ZrNx films

○Masaru Sato1, Mayumi Takeyama1, Atsushi Noya1 (Kitami Institute of Technology1)

Keywords:絶縁バリヤ,拡散バリヤ