[19p-A19-1~15] 13.3 Si Process・Interconnect・MEMS・Integration

▲ [19p-A19-3] Formation of Highly Pure Metallic Ruthenium Film Using Hot-wire-assisted Atomic Layer Deposition for Electrode Applications

^○Guangjie Yuan¹, Hideharu Shimizu¹, Takeshi Momose¹, Yukihiro Shimogaki¹ (The Univ. of Tokyo¹)

Keywords:Hot wire,Atomic layer deposition,electrode