[19p-A19-1~15] 13.3 Siプロセス・配線・MEMS・集積化技術

▲ [19p-A19-3] Formation of Highly Pure Metallic Ruthenium Film Using Hot-wire-assisted Atomic Layer Deposition for Electrode Applications

^○Yuan Guangjie，Hideharu Shimizu，Takeshi Momose，Yukihiro Shimogaki (東大院工)

キーワード：Hot wire,Atomic layer deposition,electrode