[19p-A19-1~15] 13.3 Si Process・Interconnect・MEMS・Integration

[19p-A19-6] Supercritical Fluid Chemical Deposition of Cu in Ru-lined Deep Nanotrenches using a New Cu^(I) Amidinate Precursor

Md. Rasadujjaman¹, Mitsuhiro Watanabe¹, Hiroshi Sudo², Hideaki Machida², ^○Eiichi Kondoh¹ (Univ. Yamanashi¹, Gas-phase Growth²)

Keywords:超臨界流体,Cu薄膜