The 75th JSAP Autumn Meeting, 2014

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Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-S10-1~18] 8.4 Plasma etching

Fri. Sep 19, 2014 2:15 PM - 7:00 PM S10 (S10)

5:15 PM - 5:30 PM

[19p-S10-12] Etching reaction of magnetic materials by CO cluster injection

○Kazuhiro Karahashi1, Toshio Seki2, Jiro Matsuo2, Satoshi Hamaguchi1 (Osaka Univ.1, Kyoto Univ.2)

Keywords:クラスタービーム,磁性体,カルボニル化合物