[19p-S10-1~18] 8.4 Plasma etching

[19p-S10-14] Mechanism of transition metal etching process using neutral beam oxidation and complex reaction

^○Tomohiro Kubota¹, Yoshiyuki Kikuchi^1,2, Xun Gu², Toshihisa Nozawa², Seiji Samukawa^1,3 (IFS, Tohoku Univ.¹, Tokyo Electron Ltd.², WPI-AIMR, Tohoku Univ.³)

Keywords:磁性体エッチング,第一原理理論計算,遷移金属錯体