[19p-S10-1~18] 8.4 Plasma etching

[19p-S10-18] Improvement of reaction efficiency on hydrogen plasma induced SiH₄ generation by using a Si source rotation

^○Yuta Kuwaoka¹, Takahiro Yamada^1,2, Hiroaki Kakiuchi^1,2, Kiyoshi Yasutake^1,2, Hiromasa Ohmi^1,2 (hanndaiinkou¹, jst crest²)

Keywords:プラズマ,シリコン,エッチング