3:45 PM - 4:00 PM
[19p-S10-7] Precise etch profile control of Si by using multi-step cyclic process.
Keywords:プラズマエッチング
Oral presentation
08. Plasma Electronics » 8.4 Plasma etching
Fri. Sep 19, 2014 2:15 PM - 7:00 PM S10 (S10)
3:45 PM - 4:00 PM
Keywords:プラズマエッチング