The 75th JSAP Autumn Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-S10-1~18] 8.4 Plasma etching

Fri. Sep 19, 2014 2:15 PM - 7:00 PM S10 (S10)

3:45 PM - 4:00 PM

[19p-S10-7] Precise etch profile control of Si by using multi-step cyclic process.

Motohiro Tanaka1, Yasushi Sonoda1, Yutaka Kouzuma1, Masahiro Sumiya1, Naoki Yasui1 (Hitachi High-Technologies1)

Keywords:プラズマエッチング