Influence of argon plasma on the Si and Al<sub>2</sub>O<sub>3</sub> substrates.

Presentation information

Oral presentation

08. Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

Fri. Sep 19, 2014 1:15 PM - 2:30 PM S9 (S9)

2:15 PM - 2:30 PM

^○Masashi Seki¹, Chiaki Tanuma² (TOSHIBA TEC CORPORATION¹, Hosei Univ.²)

Keywords:Arプラズマ