[20a-A19-1~12] 13.3 Si Process・Interconnect・MEMS・Integration

[20a-A19-3] Control of the Uniformity of Lithography Resolution in Minimal Mask-less Exposure System (Ⅱ)

^○Yuuji Kitayama¹, Masao Yoshioka^1,2, Ryouichi Irita^1,2, Kenji Miyake^1,2, Sommawan Khumpuang^1,3, Shiro Hara^1,3 (MINIMAL¹, PMT², AIST³)

Keywords:ミニマルファブ,ミニマル