9:30 AM - 11:30 AM
△ [20a-PA2-9] Formation mechanism of nanostructures formed in voids during thermal decomposition of SiO〈sub〉2〈/sub〉 layer
Keywords:シリコン酸化膜,熱分解,ボイド
Presentation information
Poster presentation
13. Semiconductors A (Silicon) » 13.1 Basic Properties, Surface and Interface Phenomena, and Simulation
[20a-PA2-1~11] 13.1 Basic Properties, Surface and Interface Phenomena, and Simulation
Sat. Sep 20, 2014 9:30 AM - 11:30 AM PA2 (Gymnasium1)
ポスター掲示時間9:30～11:30(PA2会場)