The 75th JSAP Autumn Meeting, 2014

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Oral presentation

07. Beam Technology and Nanofabrication » 7.4 Nanoimprint

[20p-A13-1~8] 7.4 Nanoimprint

Sat. Sep 20, 2014 1:00 PM - 3:00 PM A13 (E304)

1:00 PM - 1:15 PM

[20p-A13-1] Fabrication of high aspect Si patterns from micron to nano size linewidths

○Hiroaki Kawata1, Kazuma Shimomukai1, Masaaki Yasuda1, Yoshihiko Hirai1 (Osaka Pref. Univ,1)

Keywords:ナノインプリント,Siモールド