Session information

Oral presentation

06. Thin Films and Surfaces » 6.2 Carbon-based thin films

[17p-D6-1~11] 6.2 Carbon-based thin films

Mon. Mar 17, 2014 2:00 PM - 5:15 PM D6 (D209)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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Lunch 12:30〜14:00 (12:30 PM - 2:00 PM)

2:00 PM - 2:15 PM

[17p-D6-1] Biocompatibility of plasma treated DLC film coating on honeycomb scaffold

^○（B）Yasufumi Mabuchi¹, Haruna Tada¹, Kenji Arai¹, Yasuharu Ohgoe¹, Kenji Hirakuri¹, Naoki Fukata², Kazuhide Ozeki³ (Touden Univ.¹, NIMS², Ibaraki Univ.³)

2:15 PM - 2:30 PM

[17p-D6-2] Effects of heat treatment on iodine incorporated amorphous carbon films

^○Setsuo Nakao¹, Takashi Matsufuji², Naoki Kishi², Tetsuo Soga², Akihiro Matsumoto¹ (AIST¹, NIT²)

2:30 PM - 2:45 PM

[17p-D6-3] Characterization of a-C:Si:H Thin Films Fabricated by Low-energy Electron Beam Irradiation on Solid Thin Films formed from Hydrocarbon and Tetramethylsilane at Cryogenic Temperature

^○Ryutaro Yamada¹, Keita Seki¹, Nao Sakamaki¹, Naoki Kobayashi¹, Testuya Sato¹, Kiyokazu Nakagawa¹ (Univ. of Yamanashi¹)

2:45 PM - 3:00 PM

△ [17p-D6-4] Influence of thermal history on the electrical conductivity of amorphous carbon nitride films

^○Naoyuki Tamura¹, Masami Aono¹, Tomo Harata¹, Nobuaki Kitazawa¹, Yoshihisa Watanabe¹ (NDA¹)

3:00 PM - 3:15 PM

△ [17p-D6-5] Dependence of photo-response of a-CN_x films on deposition temperature

^○Tomo Harata¹, Masami Aono¹, Naoyuki Tamura¹, Nobuaki Kitazawa¹, Yoshihisa Watanabe¹ (NDA¹)

3:15 PM - 3:30 PM

[17p-D6-6] Double-layer a-CNx:H Film Deposition for Field Emission Using Supermagnetron Plasma

^○Haruhisa Kinoshita¹, Ryouhei Taguchi¹ (Shizuoka Univ., Grad. Sch. Eng.¹)

Break 15:30〜15:45 (3:30 PM - 3:45 PM)

3:45 PM - 4:15 PM

[17p-D6-7] [INVITED]”Spectroscopy and Thin Films” - Toward the Design of Carbon-related Films Based on the Plasma Spectroscopy

^○Haruhiko Ito¹ (Nagaoka Univ. of Tech.¹)

4:15 PM - 4:30 PM

△ [17p-D6-8] In situ RHEED Study on Growth Process of Graphene by Low Pressure Chemical Vapor Deposition

^○Takuro Minato¹, Hitoshi Nakahara¹, Koji Asaka¹, Yahachi Saito¹ (Nagoya Univ.¹)

4:30 PM - 4:45 PM

△ [17p-D6-9] Graphene Growth on SiO₂ by Heat Treatment of Amorphous Carbon with metal catalysts

^○Yohei Hasebe¹, Hitoshi Nakahara¹, Koji Asaka¹, Yahachi Saito¹ (Nagoya Univ.¹)

4:45 PM - 5:00 PM

[17p-D6-10] High-resolution ARPES of oxygen-adsorbed graphene

^○Katsuaki Sugawara¹, Toru Takahashi², Eiichi Noguchi², James Kleeman², Takafumi Sato², Takashi Takahashi^1,2 (WPI-AIMR, Tohoku Univ.¹, Department of Physics, Tohoku Univ.²)

5:00 PM - 5:15 PM

△ [17p-D6-11] Electrical properties and chemical bonding structures of boron-doped ultrananocrys-talline diamond films prepared by coaxial arc plasma deposition

^○Yuki Katamune¹, Shinya Ohmagari², Hiroyuki Setoyama³, Tsuyoshi Yoshitake¹ (Kyushu Univ.¹, AIST², Kyushu Synchrotron Light Research Center³)

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