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Outstanding Achievement Award

• 第14回応用物理学会業績賞(研究業績)受賞記念講演

Special Speech

• 総合科学技術会議議員久間和生氏特別講演

Special Symposium

• Women in Applied Physics - Part Ⅱ: Photonics -
• A new paradigm for industry-academia partnership- Towards the regeneration of Japan's core manufacturing technology -
• Research Frontier of Solid State Electornics:New history of Solid State Devices and Materials Conference

Symposium planned by Program Committee

• New trends of radiation and particle simulator
• EVALUATION -Evaluation techniques of superconductors for basic to application researches-
• Nanoelectronics Innovations and International Collaboration
• The trend of electronics technology for the automotive industry
• Recent status of crystalline silicon solar cells
• Education of the environment and energy
• Three years after the Toden Fukushima Nuclear plant disasters: Current situation and the technical development for the revival
• Innovation on energy-saving with laser ignition technologies
• Polarization Reversed devices with a flag of "Frontier"
• Flexible Electronics
• Developments and Challenges for Resistance Change Memories Technology
• Innovation of Ferroelectrics for Materials and Devices
• The Current Status and Perspective of Plasma Processing for Graphene Industries in the 21st Century
• Recent progress in spin current research
• Forefront of nano-biomaterials research
• Development of New Structures and Functions through their Molecular Control - Yasukiyo Ueda Memorial Symposium -
• Regionally produced and consumed energy system
• Beyond vacuum condition: challenges in electron/ion-based analysis in real environments
• Materials science of singularity in nitride semiconductors -growth, fabrication, creation of new functions-
• Creation of New Functional Materials by Wide-bandgap Oxide Semiconductors
• Advanced Trend of Strengthened Glass; fabrication, process, and evaluation

Symposium

• Structural health monitoring based on optical method
• Apllied physics and Mathematica
• Wide Range of Functionality on Multinary Compounds and Their New development of Characterization and application - Toward ICTMC-19 -

01. Applied Physics in General

• 1.1 Interdisciplinary and General Physics
• 1.2 Education
• 1.3 Novel Technologies and Frontier Engineering Science
• 1.4 Energy conversion and storage
• 1.5 Resources and environment
• 1.6 Magnetic field and its application
• 1.7 Instrumentation and measurement
• 1.8 Metrology
• 1.9 Ultrasonic

02. Ionizing Radiation

• 2.0 Ionizing Radiation (Poster)
• 2.1 Radiation physics and detectors
• 2.2 Detection systems
• 2.3 Application of radiation, radiation generators and technologies

03. Optics

• 3.1 Basic optics and frontier of optics
• 3.2 Materials optics
• 3.3 Equipment and device optics
• 3.4 Optical measurement
• 3.5 Information optics & photonics
• 3.6 Biomedical optics
• 3.7 Nano-optics

04. Quantum Electronics

• 4.1 Quantum and atom optics
• 4.2 Photonic nonostructures and phenomena
• 4.3 Laser systems and materials
• 4.4 Ultrashort-pulse and high-intensity lasers
• 4.5 THz technology
• 4.6 Applied laser spectroscopy and instrumentation
• 4.7 Laser processing

05. Optoelectronics

• 5.0 Optoelectronics (Poster)
• 5.1 Semiconductor laser, Light emitter / Photodetector
• 5.2 Optical Recording/Display/Lighting
• 5.3 Optical Control
• 5.4 Optical fiber

06. Thin Films and Surfaces

• 6.1 Ferroelectric thin films
• 6.2 Carbon-based thin films
• 6.3 Oxide-based electronics
• 6.4 New thin-film materials
• 6.5 Surface physics and vacuum
• 6.6 Probe microscopy

07. Beam Technology and Nanofabrication

• 7.1 X-ray technologies
• 7.2 Electron microscopes, evaluation, measurement and analysis
• 7.3 Lithography
• 7.4 Nanoimprint
• 7.5 Particle/photon-beam-induced surface reactions
• 7.6 Ion beams
• 7.7 Vacuum nanoelectronics and electron sources
• 7.8 New beam-application technologies

Plasma Electronics Invited Speech

• Plasma Electronics Invited Speech

Plasma Electronics Invited Speech

• Plasma Electronics Invited Speech

08. Plasma Electronics

• 8.1 Plasma production and control
• 8.2 Plasma measurements and diagnostics
• 8.3 Plasma deposition of thin film and surface treatment
• 8.4 Plasma etching
• 8.5 Plasma nanotechnology
• 8.6 General plasma phenomena, emerging area of plasmas and their new applications

09. Applied Materials Science

• 9.1 Dielectrics, ferroelectrics
• 9.2 Nanowires, nanoparticles
• 9.3 Nanoelectronics
• 9.4 Thermoelectric conversion
• 9.5 New functional materials and new physical properties

10. Spintronics and Magnetics

• 10.1 Creation of new materials
• 10.2 Spin torque, spin current, circuits, and measurement technologies
• 10.3 Giant magnetoresistance (GMR), tunnel magnetoresistance (TMR) and magnetic recording technologies
• 10.4 Semiconductors, organic, optical, and quantum spintronics

11. Superconductivity

• 11.0 Superconductivity (Poster)
• 11.1 Fundamental properties
• 11.2 Thin films, thick films, coated conductors and thin film crystal growth
• 11.3 Critical current, superconducting power applications
• 11.4 Analog application and its related technologies
• 11.5 Junction, circuit fabrication process and digital applications

12. Organic Molecules and Bioelectronics

• 12.1 Fabrications and Structure Controls
• 12.2 Evaluation and basic properties
• 12.3 Functional materials and novel devices
• 12.4 Organic light-emitting devices and organic transistors
• 12.5 Organic solar cells
• 12.6 Nanobiotechnology
• 12.7 Medical engineering and biochips

13. Semiconductors A (Silicon)

• 13.1 Basic Properties, Surface and Interface Phenomena, and Simulation
• 13.2 Insulator technology
• 13.3 Si Process・Interconnect・MEMS・Integration
• 13.4 Devices/Integration Technologies
• 13.5 Si-English Session

14. Semiconductors B (Exploratory Materials, Physical Properties, Devices)

• 14.1 Physical properties of exploratory materials
• 14.2 Ultrathin films and quantum nanostructures
• 14.3 Electron devices and Process technology
• 14.4 Optical properties and light-emitting devices
• 14.5 Compound solar cells

15. Crystal Engineering

• 15.1 Bulk crystal growth
• 15.2 II-VI-group crystals
• 15.3 III-V-group epitaxial crystals
• 15.4 III-V-group nitride crystals
• 15.5 IV-group crystals and IV-IV-group mixed crystals
• 15.6 IV-group-based compounds
• 15.7 Fundamentals of epitaxy
• 15.8 Crystal evaluation, impurities and crystal defects

16. Amorphous and Microcrystalline Materials

• 16.1 Fundamental properties and their evaluation in disordered materials
• 16.2 Processing technologies and devices
• 16.3 Bulk, thin-film and other silicon-based solar cells

17. Nanocarbon Technology

• 17.0 Nanocarbon Technology (Poster)
• 17.1 Growth technology
• 17.2 Structural control and process
• 17.3 Exploration of new functions and evaluation of basic properties
• 17.4 Device application

Joint Session K "Wide bandgap oxide semiconductor materials and devices"

• Nanocarbon Technology

Tutorial

• 粒子・重イオン輸送計算コードPHITS入門（本チュートリアルは応用物理学会と日本原子力研究開発機構の共催で開催します）
• レーザーディスプレイのためのスペックルの基礎と除去方式
• プラズマプロセス速度論解析の基礎とCVD/ALDへの展開
• スピントロニクスの基礎
• 超伝導体の電磁現象と磁束ピンニングの基礎

Plasma Electronics Award

• Plasma Electronics Award

Optics Award

• Optics Award

Silicon Technology Division Award

• Silicon Technology Division Award

Informal Meeting

• 多元系化合物・太陽電池研究会幹事会
• 埋もれた界面のX線　中性子解析研究会
• 日本光学会　偏光計測・制御技術研究グループ　運営委員会
• 第１６回集積化ＭＥＭＳ技術研究会委員会
• ＳＩＳＰＡＤ国内委員会
• フェローと講演奨励賞受賞者の昼食会
• 応用物理学会中国四国支部貢献賞選考委員会
• 応用物理教育分科会　幹事会
• 第2回学生研究者交流会
• 放射線分科会幹事会
• テラヘルツ電磁波技術研究会
• 光学論文賞記念昼食会
• 北陸・信越支部ミーティング
• プラズマエレクトロニクス分科会ミーティング
• 薄膜・表面物理分科会 第42期第6回幹事会および第43期第1回幹事会
• 応用物理学会中国四国支部2013年度第3回役員会
• JJAP特集編集委員会議
• 日本光学会情報フォトニクス研究グループ幹事会
• 日本光学会総会・光学論文賞授賞式
• 有機ナノ界面制御素子研究会
• 女性研究者ネットワーク女子会～ホップからステップへ～
• 応用物理教育分科会　インフォーマルミーティング
• 光学研究グループ代表者ミーティング
• 有機分子・バイオエレクトロニクス分科会インフォーマルミーティング
• シリコンテクノロジー分科会　幹事会
• スピントロニクス研究会幹事会
• 超伝導分科幹事会
• 応用物理学会中国四国支部研究会企画委員会
• APNFO10組織委員会
• OR編集・出版合同委員会
• ナイドライド基金運営委員会
• ＥＣＲＩＳプラズマインフォーマルミーティング
• OPJ2014実行委員会
• 先進パワー半導体分科会
• 応用物性分科会幹事会
• EMS33第2回運営・実行委員会

本部行事

• 応用物理学会業績賞・研究分野業績賞授賞式
• 第35回応用物理学会「講演奨励賞」贈呈式（公開）
• 懇親会

Luncheon Seminar

• American Institute of Physics (AIP)
• TOYO Corporation
• Oxford Instruments K.K.