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Plasma Electronics Invited Speech » Plasma Electronics Invited Speech

Plasma Electronics Invited Speech

[18a-E9-1~2] Plasma Electronics Invited Speech

Tue. Mar 18, 2014 10:00 AM - 11:00 AM E9 (E203)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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10:00 AM - 10:30 AM

[18a-E9-1] [INVITED]Studies of New Plasma Sources and Diagnostic

^○Haruo Shindo¹ (Tokai Univ.¹)

10:30 AM - 11:00 AM

[18a-E9-2] [INVITED]Modeling of Surface Reaction Kinetics in Plasma Etching Processes for Silicon, Metal, and High Dielectric Constant (High-k) Materials

^○Kouichi Ono¹ (Kyoto Univ.¹)