Oral presentation

[17p-F2-1~17] 8.2 Plasma measurements and diagnostics

Mon. Mar 17, 2014 2:00 PM - 6:30 PM F2 (F204)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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2:00 PM - 2:15 PM

▲ [17p-F2-1] Semiconducting alloyed silicon-tin nanocrystals synthesized via confined plasma used for quantum dot solar cells.

^○Vladimir Svrcek¹, Mickeal Lozach¹, Davide Mariiotti², Koji Matsubara¹ (AIST¹, University of Ulster²)

2:15 PM - 2:30 PM

△ [17p-F2-2] Load Impedance Measurement Using Characteristic Impedance Monitoring Method for plasma process monitoring

^○Taisei Motomura¹, Yuji Kasashima¹, Osamu Fukuda¹, Fumihiko Uesugi¹, Hiroyuki Kurita², Naoya Kimura² (AIST¹, ADVANTEST Co., Ltd.²)

2:30 PM - 2:45 PM

[17p-F2-3] Animation observation of the Two Discharge Modes on High-Vacuum Planar Magnetron Sputtering

^○Takahiro Ohno¹, Masatoshi Itoh¹, Yoshio Uhara¹, Tsutomu Miura¹, Shigeru Saito¹ (Tokyo University of Science¹)

2:45 PM - 3:00 PM

[17p-F2-4] Monte Carlo Simulation of Langmuir Probe Ion Sheaths

^○Makoto Goto¹ (Kanto Polytechnic College¹)

3:00 PM - 3:15 PM

▲ [17p-F2-5] Time-resolved Density Measurement of Pulse-modulated Plasma by Curling Probe

^○Anil Pandey¹, Wataru Sakakibara², Hiroyuki Matsuoka², Keiji Nakamura¹, Hideo Sugai¹ (Chubu University¹, DOWA Thermotech²)

3:15 PM - 3:30 PM

[17p-F2-6] Measurement of Oxygen Ion in Pulsed DC Magnetron Plasma

^○（M1）Yushi Fukuoka¹, Hayato Ogawa¹, Noriharu Takada², Hirotaka Toyoda^1,3 (Nagoya Univ.¹, Technical Center, Nagoya Univ.², PLANT, Nagoya Univ.³)

3:30 PM - 3:45 PM

[17p-F2-7] Evaluation surface loss probability of Br radical in an inductively coupled HBr plasma

^○Yoshitaka Fujii¹, Daiki Iino¹, Hirotaka Toyoda^1,2 (Nagoya Univ.¹, PLANT, Nagoya Univ.²)

3:45 PM - 4:00 PM

[17p-F2-8] Influence of process history on radical surface loss probabilities in H₂/N₂ plasma and its temporal change

^○Toshiya Suzuki¹, Yusuke Fukunaga¹, Keigo Takeda¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya University¹)

4:00 PM - 4:15 PM

△ [17p-F2-9] Evaluation of Interactions between Plasmas and Interface using Optically Trapped Single Fine Particle

^○Teppei Ito¹, Yasuhiko Morita¹, Shinya Iwashita², Daisuke Yamashita¹, Giichiro Uchida³, Kunihiro Kamataki¹, Hyunwoong Seo¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (Kyushu Univ.¹, Ruhr Univ.², Osaka Univ.³)

Break 16:15〜16:30 （4:15 PM - 4:30 PM）

4:30 PM - 4:45 PM

△ [17p-F2-10] Diagnostics of in-liquid plasma for nanographene synthesis using coherent anti-Stokes Raman scattering spectroscopy

^○Kazuaki Kojima¹, Atsusi Ando², Keigo Takeda², Kenji Ishikawa², Takayuki Ohta¹, Masafumi Ito¹, Masaru Hori² (Meijo Univ.¹, Nagoya Univ.²)

4:45 PM - 5:00 PM

△ [17p-F2-11] Measurement of density distribution of OH radicals considering collisional quenching and rotational temperature distribution in gas-liquid interface helium dc glow atmospheric plasma

^○Hiroaki Ishigame¹, Shusuke Nishiyama¹, Koichi Sasaki¹ (Hokkaido Univ.¹)

5:00 PM - 5:15 PM

[17p-F2-12] Laser Thomson scattering measurement of microwave plasmas with gas pressures above atmospheric pressure (II)

Shuntaro Soma¹, Yuji Ikeda², ^○Koichi Sasaki¹ (Hokkaido Univ.¹, Imagineering²)

5:15 PM - 5:30 PM

[17p-F2-13] Non-contact of Substrate Temperature and Heat Fluxes during Plasma Processes

^○takayoshi tsutsumi¹, keigo takeda¹, kenji ishikawa¹, hiroki kondo¹, takayuki ohta², masafumi ito², makoto sekine¹, masaru hori¹ (Nagoya Univ.¹, Meijo Univ.²)

5:30 PM - 5:45 PM

[17p-F2-14] Gas Temperature Measurement of ICP Assisted DC Magnetron Discharge by Tunable Diode Laser Absorption Spectroscopy (Ⅲ)

^○Yoshinobu Matsuda¹, Shunsuke Akiba¹, Yuya Sakaguchi¹, Masanori Shinohara¹ (Nagasaki Univ.¹)

5:45 PM - 6:00 PM

[17p-F2-15] Possibility of electron density measurement in argon-contaning plasmas by saturation spectroscopy

^○（M1C）Huimin Wang¹, Shusuke Nishiyama¹, Koichi Sasaki¹ (Hokkaido Univ.¹)

6:00 PM - 6:15 PM

[17p-F2-16] a5FJ→z5DJ-1 Spectral Line Profiles of Ti I.

^○Kenta Watanabe¹, Nobuo Nishimiya¹, Masao Suzuki¹ (Tokyo Polytechnic Univ.¹)

6:15 PM - 6:30 PM

[17p-F2-17] Bispectrum analysis of nanoparticle growth in reactive plasmas

Yasihiko Morita¹, ^○Teppei Ito¹, Daisuke Yamashita¹, Giichiro Uchida², Kunihiro Kamataki¹, Hyunwoong Seo¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (Kyushu Univ.¹, Osaka Univ.²)

Poster presentation

[18p-PA6-1~5] 8.2 Plasma measurements and diagnostics

Tue. Mar 18, 2014 1:30 PM - 3:30 PM PA6 (アリーナ)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:30 PM - 3:30 PM

[18p-PA6-1] Evaluation of basic properties to improve performances in Laser-driven Proton Acceleration

^○Hisaaki Yoshimoto¹, Atsushi Yamazaki¹, Kenichi Watanabe¹, Akira Uritani¹, Tatsuo Inoue² (Nagoya Univ.¹, Genesis Research Institute Inc.²)

1:30 PM - 3:30 PM

[18p-PA6-2] Saturation spectroscopy of argon 4s[3/2]^o₂-5p[3/2]₂ transition spectrum in electric field

^○Shusuke Nishiyama¹, Motoshi Goto², Koichi Sasaki¹ (Hokkaido Univ.¹, NIFS²)

1:30 PM - 3:30 PM

[18p-PA6-3] Measurements of current-voltage characteristics of metals in capacitive coupled Ar rf plasmas Ⅸ

^○Takashi Kubo¹ (Hiroshima Kokusai Gakuin Univ.¹)

1:30 PM - 3:30 PM

[18p-PA6-4] Effects of Substrate Temperature on Photoluminescence of GaN Films Immersed in Plasmas

Daisuke Ogawa¹, Yoshitaka Nakano¹, ^○Keiji Nakamura¹ (Chubu Univ.¹)

1:30 PM - 3:30 PM

[18p-PA6-5] Dependence of hydrogen adsorption in Si(100) due to hydrogen plasma exposure with applying substrate bias on substrate temperature

Naoki Maruno¹, Yujiro Taniguchi¹, Shohei Yagi¹, ^○Masanori Shinohara¹, Yoshinobu Matsuda¹, Hiroshi Fujiyama¹ (Nagasaki Univ.¹)

Sessions

08. Plasma Electronics » 8.2 Plasma measurements and diagnostics

[17p-F2-1~17] 8.2 Plasma measurements and diagnostics

▲ [17p-F2-1] Semiconducting alloyed silicon-tin nanocrystals synthesized via confined plasma used for quantum dot solar cells.

△ [17p-F2-2] Load Impedance Measurement Using Characteristic Impedance Monitoring Method for plasma process monitoring

[17p-F2-3] Animation observation of the Two Discharge Modes on High-Vacuum Planar Magnetron Sputtering

[17p-F2-4] Monte Carlo Simulation of Langmuir Probe Ion Sheaths

▲ [17p-F2-5] Time-resolved Density Measurement of Pulse-modulated Plasma by Curling Probe

[17p-F2-6] Measurement of Oxygen Ion in Pulsed DC Magnetron Plasma

[17p-F2-7] Evaluation surface loss probability of Br radical in an inductively coupled HBr plasma

[17p-F2-8] Influence of process history on radical surface loss probabilities in H₂/N₂ plasma and its temporal change

△ [17p-F2-9] Evaluation of Interactions between Plasmas and Interface using Optically Trapped Single Fine Particle

△ [17p-F2-10] Diagnostics of in-liquid plasma for nanographene synthesis using coherent anti-Stokes Raman scattering spectroscopy

△ [17p-F2-11] Measurement of density distribution of OH radicals considering collisional quenching and rotational temperature distribution in gas-liquid interface helium dc glow atmospheric plasma

[17p-F2-12] Laser Thomson scattering measurement of microwave plasmas with gas pressures above atmospheric pressure (II)

[17p-F2-13] Non-contact of Substrate Temperature and Heat Fluxes during Plasma Processes

[17p-F2-14] Gas Temperature Measurement of ICP Assisted DC Magnetron Discharge by Tunable Diode Laser Absorption Spectroscopy (Ⅲ)

[17p-F2-15] Possibility of electron density measurement in argon-contaning plasmas by saturation spectroscopy

[17p-F2-16] a5FJ→z5DJ-1 Spectral Line Profiles of Ti I.

[17p-F2-17] Bispectrum analysis of nanoparticle growth in reactive plasmas

[18p-PA6-1~5] 8.2 Plasma measurements and diagnostics

[18p-PA6-1] Evaluation of basic properties to improve performances in Laser-driven Proton Acceleration

[18p-PA6-2] Saturation spectroscopy of argon 4s[3/2]^o₂-5p[3/2]₂ transition spectrum in electric field

[18p-PA6-3] Measurements of current-voltage characteristics of metals in capacitive coupled Ar rf plasmas Ⅸ

[18p-PA6-4] Effects of Substrate Temperature on Photoluminescence of GaN Films Immersed in Plasmas

[18p-PA6-5] Dependence of hydrogen adsorption in Si(100) due to hydrogen plasma exposure with applying substrate bias on substrate temperature