[18p-PA6-1~5] 8.2 Plasma measurements and diagnostics

[18p-PA6-5] Dependence of hydrogen adsorption in Si(100) due to hydrogen plasma exposure with applying substrate bias on substrate temperature

Naoki Maruno¹, Yujiro Taniguchi¹, Shohei Yagi¹, ^○Masanori Shinohara¹, Yoshinobu Matsuda¹, Hiroshi Fujiyama¹ (Nagasaki Univ.¹)

Keywords:水素プラズマ,Si原子欠陥,水素の挿入