Load Impedance Measurement Using Characteristic Impedance Monitoring Method for plasma process monitoring

Presentation information

Oral presentation

08. Plasma Electronics » 8.2 Plasma measurements and diagnostics

Mon. Mar 17, 2014 2:00 PM - 6:30 PM F2 (F204)

2:15 PM - 2:30 PM

^○Taisei Motomura¹, Yuji Kasashima¹, Osamu Fukuda¹, Fumihiko Uesugi¹, Hiroyuki Kurita², Naoya Kimura² (AIST¹, ADVANTEST Co., Ltd.²)

Keywords:プラズマ,インピーダンス,モニタリング