2:00 PM - 2:15 PM

△ [18p-F3-1] 0.3 nm-high atomic-step patterning onto large PMMA surface by thermal nanoimprint

^○Geng Tan¹, Naoya Inoue¹, Tomoyuki Funabasama¹, Masahiro Mita², Norimichi Okuda³, Junichi Mori⁴, Koji Koyama⁵, Masaru Nakagawa⁶, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (Tokyo Inst. Tech¹, Kyodo Int'l Inc.², SCIVAX Inc.³, Front-L Tech. Inc.⁴, Namiki Inc.⁵, Tohoku Univ.⁶)

2:15 PM - 2:30 PM

[18p-F3-2] Fabrication of few tens nm Si nanoguide structures using UV-NIL toward obtaining sub-ten nm nanostructures

^○Azusa Hattori¹, Shunya Ito², Masaru Nakagawa², Hidekazu Tanaka¹ (ISIR, Osaka Univ.¹, IMRAM, Tohoku Univ.²)

2:30 PM - 2:45 PM

[18p-F3-3] Investigation of UV nanoimprint lithography processes for fabricating sub-100 nm Au nanostructures

^○Takuya Uehara¹, Shoichi Kubo¹, Masaru Nakagawa¹ (IMRAM, Tohoku Univ.¹)

2:45 PM - 3:00 PM

△ [18p-F3-4] The pattern formation method by electrode imprint lithography.

^○Harutake Uchida¹, Makoto Fukuda¹, Atsushi Yokoo² (Hirosaki Univ.¹, NTT Nanophotonics Center, NTT Basic Research Lab.²)

3:00 PM - 3:15 PM

[18p-F3-5] Anisotropic Wet Etching for Soda-lime Glass Using Corona Discharge Treatment

^○Daisuke Sakai¹, Takao Nishiura², Satoshi Kakuta², Junji Nishii¹ (RIES Hokkaido Univ.¹, Maruzen Petrochemical Co.,LTD.²)

3:15 PM - 3:30 PM

[18p-F3-6] Formation mechanism of fine structures on glass by electrical nanoimprint

^○Takahiro Misawa¹, Naoki Ikutame¹, Daisuke Sakai¹, Tarou Abe¹, Kenji Harada², Junji Nishii¹ (Hokkaido Univ.¹, Kitami Inst. of Tech.²)

3:30 PM - 3:45 PM

[18p-F3-7] Formation of Polarizer 6 inch whole wafer by NIL

^○Ryuta Washiya¹, Shiro Nagashima², Masaki Sugita², Akihisa Uchida², Akihiro Miyauchi¹ (Hitachi, Ltd.¹, Hitachi Media Electronics Co., Ltd.²)

3:45 PM - 4:00 PM

[18p-F3-8] Fabrication of imprint mold for 3D fluid channels by multiple step mask

^○Hiroaki Kawata¹, Kazuma Shimomukai¹, Masaaki Yasuda¹, Yoshihiko Hirai¹ (Osaka Pref. Univ,¹)

4:00 PM - 4:15 PM

△ [18p-F3-9] Fabrication of UV Nanoimprint Molds for In-Liquid Alignment

^○Kenta Suzuki^1,2, Sung-Won Youn^1,2, Qing Wang^1,2, Hiroshi Hiroshima^1,2 (AIST¹, JST-CREST²)

4:15 PM - 4:30 PM

[18p-F3-10] Fabrication of Ordered Structures by Photo-imprinting Using Anodic Porous Alumina

^○Takashi Yanagishita¹, Syouhei Suzuki¹, Kazuyuki Nishio¹, Hideki Masuda¹ (Tokyo Metropolitan Univ.¹)

Break 16:30〜16:45 （4:30 PM - 4:45 PM）

4:45 PM - 5:00 PM

[18p-F3-11] Fabrication of patterned protrusions using nano-patterned resist film

^○Osamu Yamazaki¹, Nao Shirokura¹, Jun Koike¹, Fujito Yamaguchi¹, Masatoshi Maeda¹, Shinji Arihisa¹ (Asahi Kasei E-materials¹)

5:00 PM - 5:15 PM

[18p-F3-12] Molecular Orientation of Photoreactive Liquid Crystalline Polymer Induced by Nanoimprint Graphoepitaxy

^○Makoto Okada¹, Risa Hosoda², Mizuho Kondo², Tomoyuki Sasaki³, Yuichi Haruyama¹, Hiroshi Ono³, Nobuhiro Kawatsuki², Shinji Matsui¹ (LASTI, Univ. of Hyogo¹, Graduate School of Engineering, Univ. of Hyogo², Department of Electrical Engineering, Nagaoka Univ. of Technology³)

5:15 PM - 5:30 PM

[18p-F3-13] Evaluation of release property of HSQ with PDMS additive imprinted by room temperature nanoimprinting

^○Norihiro Sugano¹, Makoto Okada¹, Yuichi Haruyama¹, Shinji Matsui¹ (Univ. of hyogo¹)

5:30 PM - 5:45 PM

[18p-F3-14] Study of Antisticking Layer Deterioration Mechanism on Repeated UV nanoimprint

^○Shuso Iyoshi^1,2, Makoto Okada^1,2, Yuichi Haruyama^1,2, Masaru Nakagawa^2,3, Hiroshi Hiroshima^2,4, Shinji Matsui^1,2 (Univ. of Hyogo¹, JST-CREST², Tohoku Univ.³, AIST⁴)

5:45 PM - 6:00 PM

△ [18p-F3-15] Simulation Study on Resist Shrinkage and De-molding Process in NIL

^○（B）Takamitsu Tochino¹, Takahiro Shiotsu¹, Kimiaki Uemura¹, Masaaki Yasuda¹, Hiroiaki Kawata¹, Yoshihiko Hirai¹ (Osaka Pref. Univ.¹, Osaka Pref. Univ.², Osaka Pref. Univ.³, Osaka Pref. Univ.⁴, Osaka Pref. Univ.⁵, Osaka Pref. Univ.⁶)

6:00 PM - 6:15 PM

[18p-F3-16] Simulation study on template releasing process based on fracture dynamics in nanoimprint lithography

Takahiro Shiotsu^1,2, Syuuua Ooi³, Youichi Watanabe³, Kimiaki Uemura^1,2, Takamitsu Tochino¹, Masaaki Yasuda^1,2, Hiroaki Kawata^1,2, Takuya Kobayashi³, ^○Yoshihiko Hirai^1,2 (Osaka prefecture university¹, JST-CREST², Mechanical design Co.³)

6:15 PM - 6:30 PM

[18p-F3-17] Simulation study on template releasing process in nanoimprint lithography(dependence on pattern structure)

Takahiro Shiotsu¹, Kimiaki Uemura¹, ^○（B）Takmaitsu Tochino¹, Masaaki Yasuda¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (Osaka Pref. Univ.¹, Osaka Pref. Univ.², Osaka Pref. Univ.³, Osaka Pref. Univ.⁴, Osaka Pref. Univ.⁵, Osaka Pref. Univ.⁶)

6:30 PM - 6:45 PM

△ [18p-F3-18] Novel of the low defects releasing procedure for nanoimprint

Takuya Kitagawa¹, ^○Naoto Nakamura¹, Hiroaki Kawata¹, Masaaki Yasuda¹, Yosihiko Hirai¹ (Osaka Pref Univ¹)

6:45 PM - 7:00 PM

[18p-F3-19] Surface Energy Modification by use of segregation agent for UV- resist in NIL

^○Naoto Nakamura¹, Tsuneo Yamashita², Takuya Kitbag sea¹, Hiroyuki Kawata¹, Yosihiko Hirai¹ (Osaka Pref Univ¹, Daikin²)

Sessions

07. Beam Technology and Nanofabrication » 7.4 Nanoimprint

[18p-F3-1~19] 7.4 Nanoimprint