[18p-F3-1~19] 7.4 Nanoimprint

[18p-F3-17] Simulation study on template releasing process in nanoimprint lithography(dependence on pattern structure)

Takahiro Shiotsu¹, Kimiaki Uemura¹, ^○（B）Takmaitsu Tochino¹, Masaaki Yasuda¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (Osaka Pref. Univ.¹, Osaka Pref. Univ.², Osaka Pref. Univ.³, Osaka Pref. Univ.⁴, Osaka Pref. Univ.⁵, Osaka Pref. Univ.⁶)

Keywords:ナノインプリント,離型,シミュレーション