Session information

Poster presentation

08. Plasma Electronics » 8.4 Plasma etching

[18p-PA7-1~2] 8.4 Plasma etching

Tue. Mar 18, 2014 1:30 PM - 3:30 PM PA7 (アリーナ)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:30 PM - 3:30 PM

[18p-PA7-1] Surface analysis of n-GaN crystal damaged by UV assisted He plasma-etching

^○Masahito Niibe¹, Shodai Hirai¹, Retsuo Kawakami², Tatsuo Shirahama², Yoshitaka Nakano³, Takashi Mukai⁴ (Univ. Hyogo¹, Univ. Tokushima², Chubu Univ.³, Nichia Corp.⁴)

1:30 PM - 3:30 PM

[18p-PA7-2] Analysis on etching rate of silicon surface by hydrogen plasma based on first-principles calculations

^○Kouji Inagaki^1,2, Yoshitada Morikawa¹, Kiyoshi Yasutake^1,2 (Osaka Univ.¹, CREST-JST²)

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