Oral presentation

06. Thin Films and Surfaces » 6.4 New thin-film materials

[19p-D6-1~18] 6.4 New thin-film materials

Wed. Mar 19, 2014 1:45 PM - 6:30 PM D6 (D209)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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Lunch 12:15〜13:45 (12:15 PM - 1:45 PM)

1:45 PM - 2:00 PM

▲ [19p-D6-1] In situ temperature measurement of oxide thin films at a nanosecond time scale during pulsed UV laser irradiation

^○Kentaro Shinoda¹, Tomohiko Nakajima¹, Tetsuo Tsuchiya¹ (AIST¹)

2:00 PM - 2:15 PM

▲ [19p-D6-2] Graphene and tungsten disulfide nanosheets prepared using liquid phase exfoliation

^○Filchito Renee Bagsican¹, Makoto Ohshiro¹, Kazuhisa Takayama¹, Iwao Kawayama¹, Hironaru Murakami¹, Andrew Winchester², Sujoy Kittu², Saikat Talapatra², Masayoshi Tonouchi¹ (Osaka Univ¹, SIU-C²)

2:15 PM - 2:30 PM

▼ [19p-D6-3] Improvement of Electrical Properties of InGaZnO Thin-Film Transistors by Fluorinated Silicon Nitride Passivation

^○（D）jingxin Jiang¹, Tatsuya Toda¹, Mamoru Furuta¹ (Kochi Univ. of Tech.¹)

2:30 PM - 2:45 PM

▼ [19p-D6-4] Extension of endurance of superhydrophilicity in Cassie-Baxter law by epitaxial growth of SiO2 overlayers on a rutile TiO2(110) surface

^○Tu Le¹, Akira Sasahara¹, Masahiko Tomitori¹ (JAIST¹)

2:45 PM - 3:00 PM

▼ [19p-D6-5] The electrical properties of binary Fe-O films deposited under various oxygen flow rate

^○Yukiko Ogawa¹, Yuji Sutou¹, Daisuke Ando¹, Junichi Koike¹ (Tohoku Univ.¹)

3:00 PM - 3:15 PM

△ [19p-D6-6] Yttrium Oxide Epitaxial Thin Films Grown Under Reductive Condition

^○Kenichi Kaminaga¹, Ryosuke Sei¹, Tomoteru Fukumura^1,2, Tetsuya Hasegawa^1,2 (Univ. Tokyo¹, JST-CREST²)

3:15 PM - 3:30 PM

△ [19p-D6-7] Fabrication and Analysis of Crystal Structure of ABO₃(A=Ca,Sr,La B=Mn,Fe) Thin Films Using High-Density Target by Pulsed Laser Deposition Method

^○Keisuke Oshima¹, Yuta Watabe¹, Takahiro Oikawa¹, Takaaki Inaba¹, Nobuyuki Iwata¹, Hiroshi Yamamoto¹, Takuya Hashimoto² (CST Nihon Univ.¹, CHS Nihon Univ.²)

3:30 PM - 3:45 PM

△ [19p-D6-8] Effect of oxygen atmosphere on LaserMBE grown Co_xO_y phases and multilayered film

^○Akifumi Matsuda¹, Satoru Kaneko^2,1, Takanori Kiguchi³, Mamoru Yoshimoto¹ (Tokyo Inst. of Tech.¹, Kanagawa Ind. Tech. Cent.², Tohoku Univ.³)

3:45 PM - 4:00 PM

△ [19p-D6-9] Fabrication of high Indium ratio ZnInON by RF magnetron sputtering

^○Koichi Matsushima¹, Ryota Shimizu¹, Tomoaki Ide¹, Daisuke Yamashita¹, Kunihiro Kamataki¹, Hyunwoong Seo¹, Kazunori Koga¹, Masaharu Shiratani¹, Naho Itagaki^1,2 (Kyushu Univ.¹, JST-PRESTO²)

4:00 PM - 4:15 PM

△ [19p-D6-10] Fabrication of TiH₂ thin films by pulsed-laser deposition

^○Takayuki Suzuki¹, Kohei Yoshimatsu¹, Nobuo Tsuchimine², Takayoshi Ohshima¹, Akira Ohtomo^1,3,4 (Tokyo Institute of Technology¹, TOSHIMA Manufacturing Co.², MCES³, JST-ALCA⁴)

Break 16:15〜16:30 (4:15 PM - 4:30 PM)

4:30 PM - 4:45 PM

[19p-D6-11] Electronic structure of p-SnS/n-Si heterojunction

^○Takeshi Inoue¹, Hidenori Hiramatsu^1,2, Hideo Hosono^1,2,3, Toshio Kamiya^1,2, Shigenori Ueda⁴, Naoki Ohashi^2,4 (MSL Tokyo Tech.¹, MCES Tokyo Tech.², FRC Tokyo Tech.³, NIMS⁴)

4:45 PM - 5:00 PM

[19p-D6-12] Bottom-up Synthesis of Non-close-packed Periodic Column Arrays

^○Shinta Suganuma¹, Yasuyuki Kaneko¹, Kyoko Namura¹, Kaoru Nakajima¹, Kenji Kimura¹, Motofumi Suzuki¹ (Kyoto Univ.¹)

5:00 PM - 5:15 PM

[19p-D6-13] Fabrication of Cubic-LaBaMnO3/ Hexagonal-ZnO Heterostructures and p-n Junction

^○（M1）Toshiki Mori¹, Akira Okada¹, Miyoshi Yokura¹, Katsuhiko Inaba², Shintaro Kobayashi², Nobuyuki Iwata³, Sanapa Reddy⁴, Tamio Endo¹ (Mie Univ.¹, Rigaku², Nihon Univ.³, S.V.D. College⁴)

5:15 PM - 5:30 PM

[19p-D6-14] Electronic Conductivity of Wide-gap Zn₃N₂ Thin Films

^○Naoomi Yamada¹, Koki Watarai¹, Xiang Cao¹, Takahiro Yamaguchi¹, Atsushi Sato¹, Yoshihiko Ninomiya¹ (Chubu Univ.¹)

5:30 PM - 5:45 PM

[19p-D6-15] Sputtering of Lanthanum Titanium Oxide for Optical Thin Films (2)

^○Ryota Nakano¹, Ryou Okuda¹, Hiroshi Murotani¹ (Tokai Univ.¹)

5:45 PM - 6:00 PM

[19p-D6-16] Effect of O₂ introduction Al doped CeO₂ thin films deposited by sputtering method (1)

^○Kenta Hara¹, Takuya Okazaki¹, Yuki Notani¹, Takashi Osawa¹, Keisuke Hibino¹, Setsu Suzuki², Keiji Ishibashi², Yasuhiro Yamamoto¹ (Hosei Univ.¹, Comet Inc.²)

6:00 PM - 6:15 PM

[19p-D6-17] Effect of O₂ introduction on Al doped CeO₂ thin films deposited by sputtering method (2)

^○Ｙｕｋｉ Notani¹, Takuya Okazaki¹, Kenta Hara¹, Takashi Osawa¹, Keisuke Hibino¹, Setsu Suzuki², Keiji Ishibashi², Yasuhiro Yamamoto¹ (Hosei Univ.¹, Comet Inc.²)

6:15 PM - 6:30 PM

[19p-D6-18] Crystal Growth and Structure Analysis of the Cr₂O₃ Thin Films on LiNbO₃ Substrates

^○Takumi Nakamura¹, Takuji Kuroda¹, Yutaro Hayashi¹, Takashi Sumida¹, Nobuyuki Iwata¹, Hiroshi Yamamoto¹ (CST, Nihon Univ.¹)