Lunch 12:30〜14:00 (12:30 PM - 2:00 PM)
Session information
Oral presentation
08. Plasma Electronics » 8.4 Plasma etching
[19p-F6-1~18] 8.4 Plasma etching
Wed. Mar 19, 2014 2:00 PM - 7:00 PM F6 (F306)
△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation
2:00 PM - 2:15 PM
○Takushi Shigetoshi1, Masanaga Fukasawa1, Kazunori Nagahata1, Tetsuya Tatsumi1 (Sony Corp.1)
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2:15 PM - 2:30 PM
○Kazuhisa Matsuda1, Toshiyuki Sasaki1, Mitsuhiro Omura1, Hisataka Hayashi1 (Toshiba S&S Co.1)
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2:30 PM - 2:45 PM
○Kohei Mizotani1, Keita Miyake1, Michiro Isobe1, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (Osaka Univ.1)
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2:45 PM - 3:00 PM
○Hu Li1, Yu Muraki1, Kazuhiro Karahashi1, Masanaga Fukasawa2, Kazunori Nagahata2, Tetsuya Tatsumi2, Satoshi Hamaguchi1 (Osaka Univ1, Sony corporation2)
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3:00 PM - 3:15 PM
○（DC）Yusuke Kondo1, Yudai Miyawaki1, Keigo Takeda1, Hiroki Kondo1, Satomi Tajima1, Kenji Ishikawa1, Toshio Hayashi1, Makoto Sekine1, Masaru Hori1 (Nagoya Univ.1)
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3:15 PM - 3:30 PM
○Yuji Kasashima1, Taisei Motomura1, Natsuko Nabeoka1, Fumihiko Uesugi1 (AIST1)
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Break 15:30〜15:45 (3:30 PM - 3:45 PM)
3:45 PM - 4:00 PM
○（M2）Zecheng Liu1, Takashi Kako1, Kenji Ishikawa1, Osamu Oda1, Keigo Takeda1, Hiroki Kondo1, Makoto Sekine1, Masaru Hori1 (Nagoya Univ.1)
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4:00 PM - 4:15 PM
▼ [19p-F6-8] Mechanism of Surface Roughness of ArF Photoresist During HBr Plasma Etching Processes (2)
○（M1）Yan Zhang1, Kenji Ishikawa1, Keigo Takeda1, Hiroki Kondo1, Makoto Sekine1, Masaru Hori1 (Nagoya Univ.1)
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4:15 PM - 4:30 PM
○Koji Eriguchi1, Masanaga Fukasawa2, Yoshinori Takao1, Tetsuya Tatsumi2, Kouichi Ono1 (Kyoto Univ.1, Sony Corp.2)
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4:30 PM - 4:45 PM
Masayuki Kamei1, ○Koji Eriguchi1, Yoshinori Takao1, Kouichi Ono1 (Kyoto Univ.1)
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4:45 PM - 5:00 PM
○kazuhiro karahashi1, yu muraki1, hu li1, masaaki matsukuma2, satoshi hamaguchi1 (Osaka Univ.1, Tokyo Electron Ltd.2)
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5:00 PM - 5:15 PM
○kazuhiro karahashi1, toshio seki2, jiro matsuo2, satoshi hamaguchi1 (Osaka Univ.1, Kyoto Univ.2)
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Break 17:15〜17:30 (5:15 PM - 5:30 PM)
5:30 PM - 5:45 PM
○Tomohiro Kubota1, Michio Sato2, Takuya Iwasaki3, Kohei Ono3, Seiji Samukawa1,4 (IFS, Tohoku Univ.1, Harada Corp.2, Mizuho I&R Inst.3, WPI-AIMR, Tohoku Univ.4)
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5:45 PM - 6:00 PM
○Erman Mohd1,5, Takeru Okada1, Taiga Isoda3,5, Kohei Ito3,5, Ichiro Yamashita4,5, Seiji Samukawa1,2,5 (IFS, Tohoku Univ.1, WPI-AIMR, Tohoku Univ.2, Keio Univ.3, NAIST4, JST-CREST5)
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6:00 PM - 6:15 PM
○Halubai Sekhar1, Tomohiro Kubota1, Takeru Okada1,4, Jitsuo Ohta3, Hiroshi Fujioka3,4, Seiji Samukawa1,2,4 (IFS, Tohoku Univ.1, WPI-AIMR, Tohoku Univ.2, IIS, Univ. of Tokyo3, JST-CREST4)
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6:15 PM - 6:30 PM
○Thomas Cedric1, Yosuke Tamura1, Akio Higo2, Takeru Okada1, Seiji Samukawa1,2 (IFS, Tohoku Univ.1, WPI-AIMR, Tohoku Univ.2)
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6:30 PM - 6:45 PM
○Toshio Hayashi1, Kenji Ishikawa1, Makoto Sekine1, Masaru Hori1 (Nagoya University1)
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6:45 PM - 7:00 PM
○Yukihiro Tsuji1, Kenichi Machinaga1, Hiroshi Inada1, Tsukuru Katsuyama1 (Sumitomo Electric Industries, Ltd.1)
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