[17p-D5-1~8] 17.2 Structural control and process

[17p-D5-6] Investigation of Defect Formation Mechanism during Plasma Etching Process for Graphene Fabrication

^○Takeru Okada¹, Koki Igarashi¹, Su Ching-Yuan², Huang Chi-Hsien³, Patrick Han⁴, Katsuaki Sugawara⁴, Hitosugi Taro⁴, Takashi Takahashi⁴, Seiji Samukawa^1,4 (IFS, Tohoku Univ.¹, National Central University², Ming Chi University of Technology³, WPI-AIMR, Tohoku Univ.⁴)

Keywords:graphene, plasma