[17p-F1-1~16] 8.3 Plasma deposition of thin film and surface treatment

[17p-F1-3] Surface Potential Evaluation of Insulating Target under RF Sputtering Assisted by Surface-Wave Excited Plasma

^○Toshiya Hagihara¹, Tomonori Noda¹, Hirotaka Toyoda^1,2 (Nagoya Univ.¹, PLANT, Nagoya Univ.²)

Keywords:マイクロ波プラズマ,RFプラズマ,スパッタリング