[17p-F1-1~16] 8.3 Plasma deposition of thin film and surface treatment

[17p-F1-4] Advanced Control of Plasma Enhanced Reactive Sputtering Process for Formation of Semiconductor Thin Films

Yuichi Setsuhara¹, ^○Kosuke Takenaka¹, Soichiro Osaki¹, Yutaro Suyama¹, Hirofumi Otani¹, Atsuki Kanai¹, Akinori Ebe² (Osaka Univ.¹, EMD Corp.²)

Keywords:プラズマ支援スパッタ