[17p-F2-1~17] 8.2 Plasma measurements and diagnostics

[17p-F2-8] Influence of process history on radical surface loss probabilities in H₂/N₂ plasma and its temporal change

^○Toshiya Suzuki¹, Yusuke Fukunaga¹, Keigo Takeda¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya University¹)

Keywords:Etching,Radical density,Surface loss