[17p-F3-1~16] 8.1 Plasma production and control

△ [17p-F3-5] Multi-charged ion beam extracted from the 2nd stage in the tandem type ECRIS

^○（M2）Keisuke Yano¹, Daiju Kimura¹, Sho Kumakura¹, Youta Imai¹, Takuya Nishiokada², Fuminobu Sato¹, Yushi Kato¹, Toshiyuki Iida¹ (Osaka Univ.¹, Osaka Univ.²)

Keywords:ECR,イオン源,イオンビーム